Effect of electrodeposition time on morphology and photoelecrochemical performance of bismuth vanadate films

Abstract In this work, facile and low cost electrodeposition method has been used to prepare bismuth vanadate (BiVO4) thin films on fluorine-doped tin oxide glass in order to study photoelectrochemical water splitting performance. The electrochemical deposition was performed at different times (5, 10, 15, 20, 25, 30, 35 and 40 min) using vanadyl sulfate and bismuth (III) nitrate solutions. The phase and microstructure analyses have been performed using X-ray diffraction (XRD) and field emission scanning electron microscopy (FE-SEM). The morphological properties of the prepared films are dependent on the electrodeposition time, based on the FE-SEM results. In addition, UV–Vis diffuse reflection spectroscopy was used to confirm the optical absorption properties and band gap of the samples prepared. Linear sweep voltammetry, chronoamperometry and open circuit potential under xenon light irradiation were used to study the photoelectrochemical properties of the films prepared. Variations of the electrodeposition time remarkably changed the photoelectrochemical properties of the films. A high photocurrent density of 0.068 mA cm−2 at 1 V vs. Ag/AgCl was shown by the film deposited for 30 min. In addition, all the samples showed good photo responses and photo stabilities.