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Electrodeposition of Nickel-Tungsten Alloy with Functional Concentration Periodically Graded Material Structure for Low Stress and High Hardness

合金 材料科学 冶金 压力(语言学) 镍合金 语言学 哲学
作者
Soobin Park,Haneul Han,Jinmyeong Seo,Jung‐Joon Park,Sanghwa Yoon,Bongyoung Yoo
出处
期刊:Journal of The Electrochemical Society [Institute of Physics]
卷期号:171 (2): 022502-022502 被引量:1
标识
DOI:10.1149/1945-7111/ad2394
摘要

A nickel-tungsten alloy film was deposited using an electrodeposition process. The tungsten concentration in the nickel-tungsten alloy was controlled by the applied current density. The surface morphology, micro-structure, internal stress, and hardness were characterized as a single-layer structure. Hardness increased as the tungsten content increased, but micro-cracks occurred on the surface. A multi-layered structure was selected to increase the hardness without micro-cracks. The multi-layered nickel-tungsten alloy film was deposited to form two types: functional periodic materials and functional graded materials. These multi-layered structures were deposited by changing the applied current density periodically and gradually, respectively, during the deposition process. The mechanical properties, such as internal stress and hardness of the nickel-tungsten alloy, were characterized as a function of the tungsten concentration of the nickel-tungsten alloy film. As the number of periods increased, the internal stress decreased, and micro-cracks were removed from the surface. However, the gradually varied nickel-tungsten alloy had higher internal stress than the periodically varied alloy. Similar hardness was observed because the concentration of nickel-tungsten film at the top of the multi-layered structure was the same. Overall, we demonstrated enhanced mechanical properties, including low internal stress and high hardness, of concentration periodically graded nickel-tungsten alloy.
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