噪声系数
电感器
电感
低噪声放大器
带宽(计算)
电气工程
单片微波集成电路
高电子迁移率晶体管
放大器
阻抗匹配
电阻抗
电子工程
电压
材料科学
计算机科学
工程类
晶体管
电信
作者
Yutao Jiang,Guodong Su,Dengbao Sun,Yongkang Huang,Zhongjie Lin,Jun Liu
标识
DOI:10.1109/imws-amp54652.2022.10106833
摘要
This paper presents a 2-stage X-band (8-12GHz) low-noise amplifier (LNA), which is fabricated in a 0.25-μm GaAs pHEMT process. The source degeneration inductor is adopted in this paper to improve the bandwidth of the LNA, which helps to increase the real part of the input impedance. The gain reduction mechanism while using the degeneration inductor is also discussed at the same time. The micro-line, which has inductance characteristics, takes place of the degeneration inductor in this paper. Therefore, a method to select this micro-line is proposed to achieve a better performance of the LNA in this paper. In addition, lossy matching networks are designed to increase the bandwidth. The measurement results of the fabricated LNA show that the typical small signal gain is 20 dB with the flatness less than ±0.4dB over the operating frequency band. The post-layout simulation results show that the output 1 dB compression point is greater than 13 dBm, the typical noise figure is of 1.5dB. The power consumption is 215mW while the supply voltage is 5V. The whole area of the presented LNA is 2.2 mm x 1.2mm.
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