电容
电容器
储能
微电子
电介质
功率密度
材料科学
超级电容器
纳米技术
物理
功率(物理)
电气工程
电压
光电子学
工程类
化学
电极
量子力学
物理化学
作者
Suraj Cheema,Nirmaan Shanker,Shang‐Lin Hsu,Joseph Schaadt,Nathan M. Ellis,Matthew Cook,Ravi Rastogi,Robert C. N. Pilawa-Podgurski,Jim Ciston,Mohamed Mokhtar Mohamed,Sayeef Salahuddin
出处
期刊:Nature
[Nature Portfolio]
日期:2024-04-09
卷期号:629 (8013): 803-809
被引量:24
标识
DOI:10.1038/s41586-024-07365-5
摘要
Dielectric electrostatic capacitors1, due to their ultrafast charge-discharge capability, are attractive for high power energy storage applications. Along with ultrafast operation, on-chip integration can enable miniaturized energy storage devices for emerging autonomous microelectronics and microsystems2-5. Additionally, state-of-the-art miniaturized electrochemical energy storage systems – microsupercapacitors and microbatteries – currently face safety, packaging, materials, and microfabrication challenges preventing on-chip technological readiness2,3,6, leaving an opportunity for electrostatic microcapacitors. Here we report record-high electrostatic energy storage density (ESD) and power density (PD) in HfO2- ZrO2-based thin film microcapacitors integrated on silicon, through a three-pronged approach. First, to increase intrinsic energy storage, atomic-layer-deposited antiferroelectric HfO2-ZrO2 films are engineered near a field-driven ferroelectric phase transition to exhibit amplified charge storage via the negative capacitance effect7-12, which enhances volumetric-ESD beyond the best-known back-end-of-the-line (BEOL) compatible dielectrics (115 J-cm-3)13. Second, to increase total energy storage, antiferroelectric superlattice engineering14 scales the energy storage performance beyond the conventional thickness limitations of HfO2-ZrO2-based (anti)ferroelectricity15 (100-nm regime). Third, to increase storage-per-footprint, the superlattices are conformally integrated into three-dimensional capacitors, which boosts areal-ESD (areal-PD) 9-times (170-times) the best-known electrostatic capacitors: 80 mJ-cm-2 (300 kW-cm-2). This simultaneous demonstration of ultrahigh energy- and power-density overcomes the traditional capacity-speed trade-off across the electrostatic-electrochemical energy storage hierarchy1,16. Furthermore, integration of ultrahigh-density and ultrafast-charging thin films within a BEOL-compatible process enables monolithic integration of on-chip microcapacitors5, which can unlock substantial energy storage and power delivery performance for electronic microsystems17-19.
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