抛光
化学机械平面化
背景（考古学）
过程（计算）
材料科学
冶金
计算机科学
地质学
操作系统
古生物学
标识
DOI：10.1016/0022-3093(90)90200-6
摘要
Chemical processes which occur during glass polishing are reviewed within the context of current mechanical models for the polishing process. The central chemical process which occurs is the interaction of both the glass surface and the polishing particle with water. A detailed mechanico-chemical model for the polishing process is proposed.
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