场电子发射
材料科学
纳米柱
共发射极
阴极
平版印刷术
阳极
纳米技术
光电子学
场发射阵列
硅
电子
纳米结构
电气工程
电极
物理
工程类
量子力学
作者
Haodong Fan,Xiaoju Wang,Linhong Zha,Kangcheng Qi,Zengjie Gu
标识
DOI:10.1088/1361-6463/ac4d49
摘要
Abstract LaB 6 nanofilm is coated on the top surface of silicon nanopillars forming a field emission array (FEA). Such a structure will be referred to subsequently as a ‘LaB 6 hat-coated Si-FEA’. The electron emission mechanism of the LaB 6 hat-coated Si-FEA is analyzed by OPERA simulation software. It reveals that the electron emission mainly depends on the LaB 6 film edge. Moreover, the LaB 6 hat-coated Si-FEA sample is prepared by microsphere lithography, and the field emission properties are tested. The results show that when the anode voltage is 850 V, the field emission current density reaches 458 mA cm −2 , which is in good agreement with the simulation results. This work demonstrates that the field emission cathodes with low cost, high integration and high current can be realized by using LaB 6 as emitter material combined with microsphere lithography technology.
科研通智能强力驱动
Strongly Powered by AbleSci AI