Reducing defect density in UiO-68–CHO is key for its efficient and reliable post-synthetic modification
钥匙（锁）
计算机科学
计算机安全
作者
Marcin Wiszniewski,Michał J. Chmielewski
出处
期刊：Molecular Systems Design and Engineering [The Royal Society of Chemistry] 日期：2023-01-01卷期号：8 (11): 1381-1387
标识
DOI：10.1039/d3me00071k
摘要
‘Healed’ UiO-68–CHO with reduced missing linker defect density is a perfect platform for PSM, giving nearly quantitative and highly reproducible yields.
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