Erasable Photopatterning of Stilbene‐Based Metal‐Organic Framework Films

The development of photosensitive materials for erasable photopatterning is of significant interest in anti-counterfeiting and information storage applications. Herein two kinds of stilbene-based metal-organic framework (MOF) films with layer by layer method for studying photopatterning is reported. The resulting 2D Zn₂ (sdc)₂ MOF film (sdc = 4,4'-stilbenedicarboxylate) exhibits excellent photosensitive features with a very short photoconversion time (<35 s) while the 3D MOF Zn₄ O(sdc)₆ film does not have the property due to the fact that only parallel and short distance arrangement of olefin groups in the adjacent MOF layers can trigger [2+2] photocycloaddition. Furthermore, the Zn₂ (sdc)₂ film indicates obvious reversible fluorescent photoswitch behavior between yellow and blue fluorescence emission, which can achieve high-efficient, erasable photopatterning with various sizes (ca. 20 microns to decimeter). This study not only develops a new kind of photosensitive crystalline network film but also provides erasable photopatterning from macroscopic to microscopic in optical applications.