光电流
光敏性
微晶
薄膜
光电导性
材料科学
光电子学
化学浴沉积
暗电流
光学
分析化学(期刊)
纳米技术
化学
光电探测器
有机化学
物理
冶金
作者
P. K. Nair,M. T. S. Nair,J. Campos
标识
DOI:10.1016/0165-1633(87)90093-1
摘要
Highly photosensitive CdS thin films with photocurrent to dark current ratios (Iph/Id) of ∼106–107 under AM2 illumination are reported. The films are prepared by an electroless chemical deposition technique. The optical microscopy along with the optical transmission spectra of the films revealed a continuous thin film ∼ 0.3–0.5 μm in thickness and with an overgrowth of single crystallites of about ∼10–20 μm in diameter. The reasons for the high photosensitivity of the freshly prepared films and the increase in the Iph/Id value upon storage are discussed. The time response of the photocurrent, an aspect which is rarely mentioned in the literature on chemically coated CdS films, is explicitly presented.
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