绝缘体上的硅
MOSFET
阈值电压
频道(广播)
材料科学
光电子学
短通道效应
信道长度调制
电气工程
硅
反向短通道效应
电子工程
电压
晶体管
工程类
作者
S. Veeraraghavan,J.G. Fossum
摘要
Short-channel effects in thin-film silicon-on-insulator (SOI) MOSFETs are shown to be unique because of dependences on film thickness and body and back-gate (substrate) biases. These dependences enable control of threshold-voltage reduction, channel-charge enhancement due to a drain bias, carrier velocity saturation, channel-length modulation and its effect on output conductance, as well as device degradation due to hot carriers in short-channel SOI MOSFETs. A short-channel effect exclusive to SOI MOSFETs, back-surface charge modulation, is described. Because of the short-channel effects, the use of SOI MOSFETs in VLSI circuits provides the designer with additional flexibility as compared to bulk-MOSFET design. Various design tradeoffs are discussed.< >
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