材料科学
电容器
复合材料
电介质
聚合物
介电损耗
聚砜
聚碳酸酯
热稳定性
玻璃化转变
化学工程
电压
光电子学
电气工程
工程类
作者
Kezhen Yin,Jingwei Zhang,Zhenpeng Li,Jingxing Feng,Ci Zhang,Xinyue Chen,Andrew Olah,D. E. Schuele,Lei Zhu,E. Baer
摘要
ABSTRACT Advanced film capacitors require polymers with high thermal stability, high breakdown strength, and low loss for high temperature dielectric applications. To fulfill such requirements, two polymer multilayer film systems were coextruded via the forced assembly technique. High glass transition temperature ( T g ) polycarbonate (HTPC, T g = 165 °C) and polysulfone (PSF, T g = 185 °C) were multilayered with a high dielectric constant polymer, poly(vinylidene fluoride) (PVDF), respectively. The PSF/PVDF system was more thermally stable than the HTPC/PVDF system because of the higher T g for PSF. At temperatures lower than 170 °C, the HTPC/PVDF system exhibited comparable breakdown strength and hysteresis loss as the PSF/PVDF system. While at temperatures above 170 °C, the PSF/PVDF system exhibited a higher breakdown strength because of the higher T g of PSF. The electric displacement‐electric field (D‐E) loop behavior of the PSF/PVDF system was studied as a function of temperature. Moreover, a melt‐recrystallization process could further decrease the hysteresis loss for the PSF/PVDF system due to better edge‐on crystal orientation. These results demonstrate that PSF/PVDF and HTPC/PVDF systems are applicable for high temperature film capacitors. © 2019 Wiley Periodicals, Inc. J. Appl. Polym. Sci. 2019 , 136 , 47535.
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