极紫外光刻
平版印刷术
计算机科学
计算光刻
曲线坐标
电磁学
构造(python库)
简单(哲学)
计算科学
模拟
电子工程
光学
物理
工程类
多重图案
抵抗
材料科学
纳米技术
哲学
程序设计语言
图层(电子)
认识论
量子力学
作者
Michael Yeung,Eytan Barouch
摘要
In this paper, we first explain why the original pseudo-spectral time-domain (PSTD) formulation, as given in a well-know book on computational electromagnetics, is numerically unstable for curvilinear geometries. Then we explain how this problem can be fixed by a simple but crucial modification to the original formulation. The new formulation has allowed us to construct a very accurate and extremely fast rigorous simulator for DUV and EUV lithography. Benchmarks are presented to demonstrate the high accuracy and great speed of the new simulator. This brings us one step closer to achieving the goal full-chip, rigorous simulation for DUV and EUV lithography.
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