1.5 MeV electron irradiation damage in β-Ga<sub>2</sub>O<sub>3</sub> vertical rectifiers
辐照
材料科学
电子
电子束处理
原子物理学
核物理学
物理
作者
Jian Yang,Fan Ren,Stephen J. Pearton,Gwangseok Yang,Jihyun Kim,Akito Kuramata
出处
期刊:Journal of vacuum science and technology [American Vacuum Society] 日期:2017-05-11卷期号:35 (3): 031208-031208被引量:43
标识
DOI:10.1116/1.4983377
摘要
Vertical rectifiers fabricated on epi Ga2O3 on bulk β-Ga2O3 were subject to 1.5 MeV electron irradiation at fluences from 1.79 × 1015 to 1.43 × 1016 cm−2 at a fixed beam current of 10−3 A. The electron irradiation caused a reduction in carrier concentration in the epi Ga2O3, with a carrier removal rate of 4.9 cm−1. The 2 kT region of the forward current–voltage characteristics increased due to electron-induced damage, with an increase in diode ideality factor of ∼8% at the highest fluence and a more than 2 order of magnitude increase in on-state resistance. There was a significant reduction in reverse bias current, which scaled with electron fluence. The on/off ratio at −10 V reverse bias voltage was severely degraded by electron irradiation, decreasing from ∼107 in the reference diodes to ∼2 × 104 for the 1.43 × 1016 cm−2 fluence. The reverse recovery characteristics showed little change even at the highest fluence, with values in the range of 21–25 ns for all rectifiers.