材料科学
纳米棒
折射率
光学
光电子学
宽带
基质(水族馆)
激光器
薄膜
高折射率聚合物
纳米技术
海洋学
物理
地质学
作者
Chuanqi Feng,Peng Zhang,Weili Zhang,Jing Sun,Jianguo Wang,Yuanan Zhao,Jianda Shao
标识
DOI:10.1016/j.optmat.2023.113965
摘要
The bandwidth and laser induced damage threshold (LIDT) are the key factors influencing the performance of broadband antireflection (AR) films in optical systems. In this study, we used glancing angle deposition (GLAD) technology to prepare an “interface free” ultrabroadband AR film with continuously varying refractive index and a nanorod structure. Owing to the changing refractive index from substrate to air, the average residual reflectivity of our AR films in the transmission band of 200–2500 nm of the entire fused quartz substrate is less than 0.55%, which is far superior to the traditional broadband AR film. Further, owing to removal of the interface and nanorod structure, the LIDTs of the ultrabroadband AR film at 1064 and 532 nm are 22.5 and 22.6 J/cm2, respectively. These are approximately 50% and 20% higher than those of the traditional 532 and 1064 nm AR film, respectively, indicating superior laser damage resistance.
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