光电子学
肖特基势垒
材料科学
电场
阳极
二极管
绝缘体(电)
击穿电压
氮化镓
肖特基二极管
反向漏电流
宽禁带半导体
阻挡层
氮化物
电压
图层(电子)
纳米技术
化学
电气工程
电极
物理
物理化学
工程类
量子力学
作者
Jingting He,Fuping Huang,Zhizhong Wang,Xuchen Gao,Kangkai Tian,Yonghui Zhang,Chunshuang Chu,Shuting Cai,Xiaowei Sun,Zi‐Hui Zhang
标识
DOI:10.35848/1347-4065/ad8417
摘要
Abstract This work employs advanced physical models with the help of technology computer-aided design tools to systematically design and investigate AlGaN/GaN Schottky barrier diodes (SBDs), focusing on enhancing forward conduction and reverse blocking characteristics. A recessed metal/insulator/III-nitride (MIS) anode is demonstrated to manage electric field distribution. The incorporation of a 1 nm thick Al 2 O 3 layer enables a reduced leakage current and a significant increase in breakdown voltage (BV). Subsequently, tailored field plates (FPs) further improve the BV of the MIS SBD to ∼1650 V but strong electric field magnitude will be found at the edge of the FP. Hence, a MIS SBD with a graded AlGaN barrier layer (MIS-GA SBD) is designed, featuring a gradient decrease in Al content along the [0001] direction. The generation of negative polarization charges within the barrier functions as a super-junction, significantly homogenizing the electric field. As a result, the MIS-GA SBD achieves a remarkable BV exceeding 3500 V, highlighting its strong potential for high-voltage power electronic applications.
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