非阻塞I/O
X射线光电子能谱
纳米晶材料
材料科学
透射电子显微镜
氧化镍
扫描电子显微镜
微观结构
化学浴沉积
分析化学(期刊)
化学工程
表面粗糙度
镍
薄膜
纳米技术
冶金
复合材料
化学
生物化学
色谱法
工程类
催化作用
作者
R. R. Ambi,A.A. Mane,R. D. Tasgaonkar,R. D. Mane
标识
DOI:10.1016/j.physb.2023.415567
摘要
Nickel oxide (NiO) thin films were deposited on to the glass substrates via chemical bath deposition (CBD) method at various deposition times of 5, 6, 7 and 8 h. The X-ray diffraction (XRD) study showed the cubic crystal structure of NiO. The field emission scanning electron microscopy (FE-SEM) images exhibit the porous structured morphology composed of randomly oriented nanosheets. The atomic force microscopy (AFM) analysis reveals the maximum surface roughness of 107.9 nm for NiO film deposited at 7 h. The X-ray photoelectron spectroscopy (XPS) study reveals the presence of Ni2+ and Ni3+ chemical states. The transmission electron microscopy (TEM) images reveal an average size of 5 nm for NiO nanocrystalline particles. The nitrogen dioxide (NO2) gas sensing performance was tested at various working temperatures and gas concentrations. The sensing tests showed 45.6 % response to 100 ppm NO2 at 200 °C with Tresponse = 13 s and Trecovery = 146 s.
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