电迁移
材料科学
记忆电阻器
空位缺陷
氧气
凝聚态物理
纳米技术
电子工程
复合材料
物理
量子力学
工程类
作者
Rodrigo Leal Martir,M. J. Sánchez,Myriam H. Aguirre,Walter Quiñonez,Cristian Ferreyra,C. Acha,Jerome Lecourt,U. Lüders,D. Rubi
出处
期刊:Nanotechnology
[IOP Publishing]
日期:2022-11-24
卷期号:34 (9): 095202-095202
被引量:3
标识
DOI:10.1088/1361-6528/aca597
摘要
Memristors are expected to be one of the key building blocks for the development of new bio-inspired nanoelectronics. Memristive effects in transition metal oxides are usually linked to the electromigration at the nanoscale of charged oxygen vacancies (OV). In this paper we address, for Pt/TiOx/TaOy/Pt devices, the exchange of OV between the device and the environment upon the application of electrical stress. From a combination of experiments and theoretical simulations we determine that both TiOxand TaOylayers oxidize, via environmental oxygen uptake, during the electroforming process. Once the memristive effect is stabilized (post-forming behavior) our results suggest that oxygen exchange with the environment is suppressed and the OV dynamics that drives the memristive behavior is restricted to an internal electromigration between TiOxand TaOylayers. Our work provides relevant information for the design of reliable binary oxide memristive devices.
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