Decoupling the Conflicting Roles of Photoactivation and Boosting Chemiresistor Response by Pulsed UV Light Modulation

UV photoactivation has been widely employed to trigger the response of semiconductor chemiresistors at room temperature (RT). Generally, continuous UV (CU) irradiation is applied, and an apparent maximal response could be obtained via optimizing UV intensity. However, owing to the conflicting roles of (UV) photoactivation in the gas response process, we do not think the potential of photoactivation has been fully explored. Herein, a pulsed UV light modulation (PULM) photoactivation protocol has been proposed. Pulsed UV-on facilitates the generation of surface reactive oxygen species and refreshes the surface of chemiresistors, while pulsed UV-off avoids the side effects of UV-induced desorption of the target gas and the decline of base resistance. PULM enables decoupling those conflicting roles of CU photoactivation, resulting in a drastic boost of response to trace (20 ppb) NO2 from 1.9 (CU) to 131.1 (PULM UV-off), and a decline of limit of detection from 2.6 ppb (CU) to 0.8 ppb (PULM) for a ZnO chemiresistor. This work highlights that PULM allows full exploitation of the potential of nanomaterials for sensitively detecting trace (ppb-level) toxic gas molecules and opens a new opportunity for designing highly sensitive, low-power consumed RT chemiresistors for ambient air quality monitoring.