电流体力学
复制品
材料科学
纳米技术
不稳定性
印记(心理学)
复制(统计)
接触面积
斜面
图案形成
机械
复合材料
机械工程
物理
电场
化学
工程类
数学
艺术
视觉艺术
生物化学
统计
遗传学
量子力学
生物
基因
作者
Hyunje Park,J. C. Hwang,Heejoon Chae,Dae Joon Kang
出处
期刊:Small
[Wiley]
日期:2024-04-21
标识
DOI:10.1002/smll.202400155
摘要
Abstract Nanopatterning driven by electrohydrodynamic (EHD) instability can aid in the resolution of the drawbacks inherent in conventional imprinting or other molding methods. This is because EHD force negates the requirement of physical contact and is easily tuned. However, its potential has not examined owing to the limited size of the pattern replica (several to tens of micrometers). Thus, this study proposes a new route for large‐area patterning through high‐speed evolution of EHD‐driven pattern growth along the in‐plane axis. Through the acceleration of the in‐plane growth, while selectively controlling a specific edge growth, the pattern replica area can be extended from the micro‐ to centimeter scale with high fidelity. Moreover, even in the case of nonuniform contact mode, the proposed rapid in‐plane growth mode facilitates uniform large‐scale replication, which is not possible in conventional imprinting or other molding methods.
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