纳米网
材料科学
电磁屏蔽
透射率
光电子学
制作
聚焦离子束
光学
复合材料
纳米技术
石墨烯
离子
病理
物理
医学
替代医学
量子力学
作者
Zhuocheng Liang,Zeyu Zhao,Mingbo Pu,Jun Luo,Xin Xie,Yanqing Wang,Yinghui Guo,Xiaoliang Ma,Xiangang Luo
摘要
This paper reports a high-performance transparent electromagnetic shielding material based on an ultrathin and large-area metallic nanomesh, which was fabricated by a facile and rational process utilizing ultraviolet lithography and the ion beam etching technique. Measurements reveal that a single-layer metallic nanomesh can harvest excellent shielding effectiveness exceeding 40 dB in the wide frequency range from 500 MHz to 40 GHz. Besides, efficient light transmittance (85% at 550 nm) is achieved in both visible and near-infrared regions. Furthermore, the proposed structure remains excellent performance at wide incident angles even up to 50°. Hence, it is believed that this metallic nanomesh with easy fabrication can be a potential alternative in the transparent electromagnetic shielding domain.
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