Design and Analysis of Antireflection Layer on the Surface of Crystalline Silicon Solar cell

With the positive development of photovoltaic technology, improving efficiency and reducing cost has become a global problem facing the solar industry. The development of solar cell anti-reflection film can significantly reduce the reflection of sunlight on the surface of the battery, increase the flux of light entering the battery, and create more photo-generated carriers, which is the most economical and effective way to improve the efficiency of the battery. More photo-generated carriers are produced, which is the most economical and effective way to improve the efficiency of batteries. Therefore, it’s of great value to explore a performance-matched antireflective film material for solar cells and its preparation process. The plasma enhanced chemical vapor deposition of silicon nitride antireflective coatings has been widely used in photovoltaic industry. The aim is to form an antireflection film on the surface of crystalline silicon solar cells and achieve good passivation effect. The thickness and refractive index of the antireflective film have an important influence on the performance of the battery. It is of great significance to explore the optimum technological conditions for preparing the optimum thin films. Considering the optical properties, stability, preparation process and production cost of antireflective film materials, the influence of antireflective film on the output characteristics of solar cells was studied by using PC1D simulation software.