肖特基势垒
杰纳斯
工作职能
材料科学
单层
凝聚态物理
偶极子
半导体
费米能级
密度泛函理论
光电子学
纳米技术
化学
物理
计算化学
图层(电子)
二极管
量子力学
电子
有机化学
作者
Jing Li,Wenhan Zhou,Liqiang Xu,Jialin Yang,Hengze Qu,Tingting Guo,Biao Xu,Shengli Zhang,Haibo Zeng
标识
DOI:10.1016/j.mtphys.2022.100749
摘要
Schottky barrier height (SBH), an energy barrier exists at the contact interface between two-dimensional (2D) semiconductor and metal electrode, plays a pivotal role in realizing high device performance. However, the SBH regulation by varing the metal work function is often blocked by the Fermi level pinning (FLP) effect. Herein, based on the density functional theory calculations, we reveal a weak FLP between monolayer In2Ge2Te6 (or Janus In2Ge2Te3Se3) and a series of 2D metals with the work functions spanning around 2 eV. This weak FLP at 2D/2D interface is mainly governed by the potential step between the metal side and semiconductor side in the junctions, which can be evidenced by the good agreement between the modified SBH and the Schottky-Mott limit. In particular, the potential step and its associated interface dipole (or net dipole) presents a linear proportional relationship for In2Ge2Te6-based junctions (or Janus In2Ge2Te3Se3-based junctions) with a slope of ca. 4. The mirror symmetry breaking of Janus In2Ge2Te3Se3 leads to a weaker FLP of Se side than that of Te side owing to the synergistic effect of interface dipole and intrinsic dipole. Therefore, the dipole strength in such 2D/2D junctions can be identified as a target feature of designing low resistance contact, which provides the guidance for reducing the FLP to obtain the tunable SBH and improving the device performance.
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