Personal protective masks play critical role in preventing the disease epidemic and resisting pathogenic bacterial infestation. However, large quantities of masks were disposed during COVID-19 epidemic, which caused environmental problem and huge economic burden. Herein, we developed reusable masks with inherent antimicrobial and self-cleaning features under solar irradiation. With spun-bonded nonwoven fabrics (SNF) layer as substrate, copper sulfide@polydopamine nanoparticles are deposited on SNF layer (CuS@PDA