离子液体
铜
电解质
电镀(地质)
材料科学
镀铜
水溶液
循环伏安法
电解
银纳米粒子
动态光散射
电化学
化学
无机化学
化学工程
电镀
冶金
纳米颗粒
电极
复合材料
有机化学
纳米技术
物理化学
图层(电子)
地球物理学
工程类
地质学
催化作用
作者
Kashif Riaz,Firdous Imran Ali,Agha Arslan Wasim,Faisal Rafique,Muhammad Naveed Javed,Syed Abid Ali,Imran Ali Hashmi
标识
DOI:10.1016/j.molliq.2023.123704
摘要
Immersion silver-plating technique is typically used for uniform coating on printed circuit boards (PCB) for finishing. Herein, we report an unconventional protocol for preparation of non-toxic immersion silver-plating solution/bath. The solution was prepared through electrolysis using ionic liquid (1, 3-disulfonic acid imidazolium hydrogen sulfate [Dsim] [HSO4]) as electrolyte, metallic silver (Ag) as anode and copper as cathode. As a result of electrolysis, IL-capped aqueous charged silver ion (Ag+) solution [colloidal Ag-IL adduct solution] is obtained. Presence of Ag+ in solution was verified by cyclic voltammetry (CV) experiments. Chemical reduction of Ag+ with Hydrazine Hydrate (NH2-NH2·H2O) yielded AgNPs. The AgNPs analyzed through dynamic light scattering (DLS) exhibiting 269.99 ± 14.2 nm size with Polydispersity Index (PDI) 0.126. The metallic copper strip immersed into the solution and a shiny silver plated surface obtained within 1–5 min at room temperature. Film thickness can be controlled by varying time of immersion. The corrosion rate was found to be 0.0012 mm/a by Tafel fitting. The solution is stable for the months without losing efficiency whereas the recovered IL used five times without significant loss in efficiency.
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