介质阻挡放电
表面改性
X射线光电子能谱
衍生化
类金刚石碳
等离子体
氮气
分析化学(期刊)
接触角
碳纤维
材料科学
大气压力
等离子清洗
化学
电介质
化学工程
薄膜
纳米技术
复合材料
有机化学
质谱法
光电子学
色谱法
物理化学
复合数
工程类
地质学
物理
海洋学
量子力学
作者
Carmen López‐Santos,F. Yubero,José Cotrino,Leopoldo Contreras,Ángel Barranco,Agustín R. González‐Elipe
标识
DOI:10.1002/ppap.200900019
摘要
Abstract Diamond like carbon (DLC) thin films have been exposed to different nitrogen containing plasmas. A dielectric barrier discharge (DBD) at atmospheric pressure and a microwave discharge (MW) at low pressure using N 2 and mixtures Ar + NH 3 have been compared. Optical Emission and X‐ray Photoelectron spectroscopies, Atomic Force Microscopy and contact angle measurements have been used for this study. A DBD with Ar + NH 3 is the most efficient method for DLC functionalization. Films treated with this plasma presented the highest concentration of amine groups as determined by derivatization with 4‐chlorobenzaldehyde. All the treated samples underwent a significant aging with time. The efficiency of the different plasmas for DLC functionalization is discussed in the light of the intermediate species detected in the plasma. magnified image
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