A review of Pure and Doped ZnO Nanostructure Production and its Optical Properties Using Pulsed Laser Deposition Technique

Abstract In this review, the theoretical and experimental aspects of ZnO nanostructures production using pulsed laser deposition techniques were presented. It reviewed the work principles of pulse laser deposition technique (PLD) method, physical procedures such as ablation, and plasma plume creation accompanying the deposition of pure and doped ZnO from target to substrate material. Many ways of deposition and elements that affecting on the properties of thin films like the temperature of substrate, laser fluence (laser energy density), pulse repetition rate, pressure of oxygen in chamber, time of deposition process and post growth annealing which modify the deposition active factors like nucleation, and crystallization.