期刊:IEEE Microwave and Wireless Components Letters [Institute of Electrical and Electronics Engineers] 日期:2021-11-13卷期号:32 (4): 339-342被引量:3
标识
DOI:10.1109/lmwc.2021.3123947
摘要
A 1–42 GHz gain-variable distributed amplifier is presented in the letter using a 0.13- $\mu \text{m}$ gallium nitride (GaN) process. The amplifier can achieve a gain tuning range of about 3 dB over the entire frequency band by voltage-controlled switching. The chip area of the amplifier is about $1.9\times1.1$ mm 2 . The average output power of the amplifier is greater than 27.5 dBm over the entire bandwidth. A wider gain tuning range can be achieved by adding more voltage-controlled switches.