材料科学
纳米压痕
化学气相沉积
氮化硼
石墨烯
钨
二硫化钨
纳米技术
氮化物
化学工程
图层(电子)
复合材料
冶金
工程类
作者
Hong Wang,Emil Sandoz‐Rosado,Siu Hon Tsang,Jinjun Lin,Min Zhu,Govind Mallick,Zheng Liu,Edwin Hang Tong Teo
标识
DOI:10.1002/adfm.201902663
摘要
Abstract 3D transition metal nitrides are well recognized for their good electrical conductivity, superior mechanical properties, and high chemical stability. Recently, 2D transition metal nitrides have been successfully prepared in the form of nanosheets and show potential application in energy storage. However, the synthesis of highly crystalline and well‐shaped 2D nitrides layers is still in demand for the investigation of their intrinsic physical properties. The present paper reports the growth of ultrathin tungsten nitride crystals on SiO 2 /Si substrates by a salt‐assisted chemical vapor deposition method. High‐resolution transmission microscopy confirms the as‐grown samples are highly crystalline WN. The stiffness of ultrathin WN is investigated by atomic force microscopy–based nanoindentation with the film suspended on circular holes. The 3D Young's modulus of few‐layer (4.5 nm thick or more) WN is determined to be 3.9 × 10 2 ± 1.6 × 10 2 GPa, which is comparable with the best experimental reported values in the 2D family except graphene and hexagonal boron nitride. The synthesis approach presented in this paper offers the possibilities of producing and utilizing other highly crystalline 2D transition‐metal nitride crystals.
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