Utilizing an aspheric lens and compound ellipsoidal cavity for laser uniform illumination system

光学 镜头(地质) 材料科学 激光器 物理
作者
Yu Lu,Xiangxiang Zhang,Ruilong Wu
出处
期刊:Applied Optics [The Optical Society]
卷期号:63 (27): 7225-7225
标识
DOI:10.1364/ao.530431
摘要

To achieve uniform laser illumination of an active imaging system with a small aperture diameter and large field angle, we have developed what we believe to be a novel structure for achieving uniform beam shaping that integrates a laser source, an aspheric lens, and a composite ellipsoidal cavity to enable active laser illumination. Through an aspheric lens, the fundamental mode Gaussian beam is transformed into double Gaussian and flat-top radiation at the target plane. The double Gaussian radiation is further reflected by a complex ellipsoidal cavity, where it is evenly distributed into equal radiation flux. This flux combines with the flat-top radiation, resulting in a uniform distribution at the target plane. The parameters of the complex ellipsoidal cavity are determined using an equalization algorithm. After combining the transmission for flat-top shaping by the aspheric lens and secondary reflection shaping by the composite ellipsoidal cavity, we achieved an aperture measuring 29.7 mm with an aperture angle of 84.0°, at a distance of 2 m from the target plane, with a diameter of 3.6 m, resulting in uniformity reaching 92.7%. RMS and M T / R determine the effectiveness of the compound ellipsoidal cavity design, depending on the maximum reflection angle and transmission angle. M T / R is inversely proportional to the maximum reflection angle, while RMS is directly proportional to the transmission angle. By setting the maximum reflection angle to 32.0° and the transmission angle to 8.0°, we were able to achieve a minimum root-mean-square focusing radius of 108.6 µm along with a minimum effective M T / R ratio of 1.07. The overlap degree between transmission and reflection directly impacts the target plane’s uniformity, adjusted through a defined adjustment factor. Optimizing this factor to 0.9 maximizes the uniformity of the target plane.

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