钻石
钨
材料科学
金刚石材料性能
密度泛函理论
抛光
碳纤维
结晶学
纳米技术
化学物理
冶金
复合材料
化学
计算化学
复合数
作者
Hongchao Wang,Zhuji Jin,Xuehua Li,Xingchen Guo
标识
DOI:10.1016/j.apsusc.2022.154640
摘要
In the ultra-precision machining field, tungsten (W) is a promising material as a polishing disc for machining diamond, which is easier to obtain high-quality diamond surfaces than cast iron. The removal mechanism of the diamond during high-speed polishing is considered surface graphitization. In this work, the diamond graphitization mechanism induced by tungsten is revealed by the density functional theory (DFT). The results show that the W adatoms at the fcc sites can activate the interlayer C-C bonds, causing the surface carbon atoms to separate. Notably, the electron transfer of W atoms and the structure contraction of the diamond surface cause the graphitization. Moreover, the movement of W adatoms intensifies the diamond surface structure transformation and graphitization process. It is worth noting that the W adatoms of the fcc and hcp sites have different contributions to the surface carbon atom separation during the interfacial sliding process. When the W atoms cross the hcp sites, the pulling force of the W-C bonds promotes the reconfiguration of the separated surface carbon atoms. The diamond-to-graphite transition is attributed to catalyst activation by W adatoms, diamond surface structure contraction, and mechanical tensile stress by the W-C bonds.
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