材料科学
光电子学
光刻
太阳能电池
非晶硅
能量转换效率
蚀刻(微加工)
开路电压
硅
异质结
晶体硅
纳米技术
电压
电气工程
工程类
图层(电子)
作者
A. Tomasi,Bertrand Paviet‐Salomon,D. Lachenal,Silvia Martín de Nicolás,Martin Ledinský,Antoine Descoeudres,Sylvain Nicolay,Stefaan De Wolf,Christophe Ballif
标识
DOI:10.1109/pvsc.2014.6924898
摘要
We report on the development of interdigitated back-contacted silicon heterojunction solar cells with conversion efficiencies well above 21%. Doped hydrogenated amorphous silicon layers, needed for electron and hole collection, are patterned via in-situ shadow masking whereas transparent conductive oxide and metal layers, of the back electrodes, are defined via hot melt inkjet printing of an etch resist and subsequent wet etching. Our technology is therefore photolithography-free and avoids any high-temperature step. The best fabricated solar cell presents a high short-circuit current density of 39.9 mA/cm 2 , an open-circuit voltage of 724 mV and a fill factor of 74.5% resulting in a conversion efficiency of 21.5%, with a strong upside potential. We report also on a silver-free IBC-SHJ solar cell with conversion efficiency >20%.
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