薄脆饼
硅
蚀刻(微加工)
材料科学
热的
棱锥(几何)
反应离子刻蚀
纳米技术
分析化学(期刊)
矿物学
结晶学
光电子学
化学
光学
热力学
环境化学
物理
图层(电子)
作者
W. K. Choi,James Y.L. Thong,P. Luo,Chao Tan,TeckMean Chua,Yan Bai
标识
DOI:10.1016/s0924-4247(98)00193-9
摘要
An investigation on the influence of etchant concentration, ambient temperature and wafer thermal history on the formation of pyramids arising from the TMAH etching of silicon has been carried out. The number and size of the pyramids were used as parameters for the investigation. From the results obtained from this study, we are able to explain the influence of the TMAH concentration and ambient temperature on the changes occurring at the silicon surface satisfactorily using the pH theory. However, the results from the rapid thermal annealed, the as-received Czochralski wafers, and the float zone wafers seem to favour the defects theory. We suggest that in order to explain the etching mechanism of TMAH of silicon satisfactorily, a combination of the pH and the defects theories is necessary.
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