材料科学
微观结构
溅射沉积
韧性
透射电子显微镜
复合材料
偏压
扫描电子显微镜
溅射
腔磁控管
氮化铬
氮化物
冶金
薄膜
电压
纳米技术
图层(电子)
电气工程
工程类
作者
Yu Xi Wang,Sam Zhang,Jyh‐Wei Lee,Wen Siang Lew,Bo Li
标识
DOI:10.1016/j.surfcoat.2012.06.041
摘要
Chromium aluminum nitride (CrAlN) coatings were prepared via magnetron sputtering in a mixed Ar and N2 ambient. The effect of negative bias voltage (Vb) on the microstructure was investigated using a spectrum of characterizing techniques in terms of Glancing Angle X-ray Diffractometry, Field Emission Scanning Electron Microscopy and Transmission Electron Microscopy. As Vb increased from 50 to 260 V, hardness was improved from 10 to 26 GPa. Toughness grew at the same time and maximized at around 2 MPa·m1/2 when Vb = 210 V. Simultaneous improvements in hardness and toughness were attributed to the densified microstructure with refined grains and increased compressive stress.
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