硅烷
分解
非晶硅
热分解
材料科学
硅
无定形固体
辉光放电
化学工程
硅烷
氢
化学分解过程
等离子体
复合材料
晶体硅
化学
有机化学
光电子学
物理
工程类
量子力学
出处
期刊:Physica Scripta
[IOP Publishing]
日期:1981-08-01
卷期号:24 (2): 396-398
被引量:1
标识
DOI:10.1088/0031-8949/24/2/009
摘要
Hydrogenerated amorphous silicon is usually prepared by decomposition of silane at low temperature T < 400°C in a glow discharge environment. Recently we have explored a novel process involving thermal decomposition of silane around 600°C followed by post-hydrogenation in a hydrogen plasma. The physical properties of this type of film are discussed and compared to those of films prepared in the usual way.
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