铍
极紫外光刻
极端紫外线
反射计
材料科学
光学
同步辐射
同步加速器
薄膜
光学涂层
吸收(声学)
X射线光学
平版印刷术
光电子学
X射线
物理
纳米技术
激光器
时域
计算机科学
核物理学
计算机视觉
作者
М. Г. Сертсу,Andréy Sokolov,Н. И. Чхало,В. Н. Полковников,N. N. Salashchenko,М. В. Свечников,F. Schäfers
出处
期刊:Optical Engineering
[SPIE - International Society for Optical Engineering]
日期:2021-04-10
卷期号:60 (04)
被引量:3
标识
DOI:10.1117/1.oe.60.4.044103
摘要
Mo/Be multilayers are promising optical elements for extreme ultraviolet (EUV) lithography and space optics. Experimentally derived optical constants are necessary for accurate and reliable design of beryllium-containing optical coatings. We report optical constants of beryllium derived from synchrotron radiation-based reflectivity data of Mo/Be multilayers. Results are in good agreement with available data in the literature obtained from the well-known absorption measurements of beryllium thin films or foils. We demonstrate synchrotron based at-wavelength reflectometry as an accurate and non-destructive technique for deriving EUV optical constants for materials that are difficult or unstable to make thin foils for absorption measurements.
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