重氮
材料科学
聚合物
光化学
共聚物
共价键
可见光谱
卡宾
聚合
基质(水族馆)
辐照
高分子化学
化学工程
催化作用
有机化学
光电子学
化学
复合材料
海洋学
物理
核物理学
地质学
工程类
作者
Dennis Rusitov,Florian Deussen,Jürgen Rühe
标识
DOI:10.1002/admi.202300316
摘要
Abstract The synthesis and characterization of highly photosensitive coatings containing a diazo‐based crosslinker that exhibits high photoreactivity in the near‐visible UV and toward sunlight is present. Nitrophenyl diazo ester (nitroPEDAz) moieties are incorporated into polymer chains via free radical polymerization and generate upon irradiation carbenes, which undergo a CH insertion‐based crosslinking (CHic) reaction. The copolymers are deposited onto substrate surfaces through known coating techniques and then activated to form polymer networks and simultaneously attach covalently to the surfaces if CH groups are available. It is demonstrated that very low light doses on the order of 20 mJ cm −2 are sufficient to generate surface‐attached networks and that the copolymer can be patterned photolithographically into defined structures on a broad spectrum of substrates using UV‐ and natural sunlight. Even a few seconds of sunlight exposure are sufficient to crosslink and surface‐attach the film.
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