晶体管
神经形态工程学
材料科学
光电子学
薄膜晶体管
记忆
二氧化硅
电压
电解质
计算机科学
纳米技术
电气工程
化学
电极
人工智能
心理学
工程类
图层(电子)
人工神经网络
冶金
数学教育
物理化学
作者
Yang Ming Fu,Tianye Wei,Joseph Brownless,Long Huang,Aimin Song
摘要
The human brain is capable of short- and long-term memory with retention times ranging from a few seconds to several years. Electrolyte-gated transistors have drawn attention for their potential to mimic synaptic behaviors in neuromorphic applications, but they generally operate at low voltages to avoid instability and, hence, offer limited tunability. Sputtered silicon dioxide electrolytes are utilized in this work to gate indium-gallium-zinc-oxide thin-film transistors, which offer robust operation at much higher voltages. The synaptic memory behavior is studied under single and multiple pulses and under mild (1 V) and strong stimuli (up to 8 V). The devices are found to be capable of providing an extremely wide range of memory retention time from ∼2 ms to ∼20 000 s, over seven orders of magnitude. Furthermore, based on the experimental data on individual transistors, pattern learning and memorizing functionalities are conceptually demonstrated.
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