钻石
兴奋剂
杂质
菱形
材料科学
半导体
金刚石材料性能
光电子学
纳米技术
电导率
工程物理
化学
物理
冶金
物理化学
有机化学
出处
期刊:Elsevier eBooks
[Elsevier]
日期:2014-01-01
卷期号:: 305-319
被引量:1
标识
DOI:10.1016/b978-0-08-096527-7.00049-0
摘要
It has been shown that p- and n-type doped diamond films and combinations can be applied for a variety of electronic and optoelectronic applications. To achieve success, a comprehensive knowledge of doping technology and related analysis techniques are required. For p-type doping, the impurity boron is easily incorporated into both natural and synthesized diamond, whereas n-type diamond, which is not present in nature, has been recently developed by phosphorus doping. Progress in p- and n-type doping of diamond semiconductors has stimulated extensive research on the various types of p-n junction devices, bringing diamond closer to practical applications for future electronics. In this chapter, details of homoepitaxy growth and impurity doping in single-crystal diamond are summarized, especially in n-type diamond by phosphorus doping. Diamond growth and doping, electronic properties, electrical conductivity, contact metallization, and junction applications are described below.
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