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Review of Material Properties of Oxide Semiconductor Thin Films Grown by Atomic Layer Deposition for Next-Generation 3D Dynamic Random-Access Memory Devices
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Optimizing the Performance of the Atomic-Layer-Deposited Zinc–Tin-Oxide Thin Film Transistor by Ozone Treatment and Thermal Annealing
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Improving Device Characteristics of Dual-Gate IGZO Thin-Film Transistors with Ar–O2 Mixed Plasma Treatment and Rapid Thermal Annealing
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Recent Trends in Copper Metallization
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Plasma-enhanced atomic layer deposition of silicon nitride thin films with different substrate biasing using Diiodosilane precursor
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Review of FinFET Devices and Perspective on Circuit Design Challenges
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A Comprehensive Review on FinFET in Terms of its Device Structure and Performance Matrices
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Electrode surface engineering by atomic layer deposition: A promising pathway toward better energy storage
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