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50 积分 2024-10-17 加入
Influence of Etch Profiles on the Leakage Current and Capacitance of 3-D DRAM Storage Capacitors
24天前
已关闭
Toward Advanced High‐k and Electrode Thin Films for DRAM Capacitors via Atomic Layer Deposition
1个月前
已完结
High-k Oxides on Si: MOSFET Gate Dielectrics
1个月前
已完结
Patterning optimization for single mask bit-line-periphery and storage-node-landing-pad DRAM layers using 0.33NA EUV lithography at the resolution limit
1个月前
已完结
Introducing Y2O3 passivation layer for utilizing TiSiN electrode on ZrO2-based metal-insulator-metal capacitor applications
1个月前
已完结
Atomic layer deposition of high-k and metal thin films for high-performance DRAM capacitors: a brief review
1个月前
已完结
Introducing Y2O3 passivation layer for utilizing TiSiN electrode on ZrO2-based metal-insulator-metal capacitor applications
1个月前
已关闭
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