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Introducing Y2O3 passivation layer for utilizing TiSiN electrode on ZrO2-based metal-insulator-metal capacitor applications
1小时前
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Atomic layer deposition of high-k and metal thin films for high-performance DRAM capacitors: a brief review
3小时前
已完结
Introducing Y2O3 passivation layer for utilizing TiSiN electrode on ZrO2-based metal-insulator-metal capacitor applications
3小时前
已关闭
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