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60 积分 2024-05-20 加入
Atomic layer etching of Al2O3 with NF3 plasma fluorination and trimethylaluminum ligand exchange
1天前
已完结
Experimental and numerical investigations of the characteristics of electron density in O2/Ar pulsed planar-coil-driven inductively coupled plasmas
8个月前
已完结
Perspectives on nitride ferroelectric semiconductors: Challenges and opportunities
10个月前
已完结
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