Lv4
408 积分 2024-06-25 加入
Focusing electrode effect on the EUV lighting technology based on C-beam irradiation technique
2天前
求助中
Laser-excited Xe plasma as a radiation source for lithography at wavelengths near 11 nm
2天前
求助中
Compact vacuum setup for laser induced plasma etching with optical emission spectrum monitoring
2天前
求助中
Compact vacuum setup for laser induced plasma etching with optical emission spectrum monitoring
17天前
已关闭
Machine learning-based prediction of the electron energy distribution function and electron density of argon plasma from the optical emission spectra
21天前
已完结
Compact vacuum setup for laser induced plasma etching with optical emission spectrum monitoring
22天前
已关闭
Focusing electrode effect on the EUV lighting technology based on C-beam irradiation technique
27天前
已关闭
Laser-excited Xe plasma as a radiation source for lithography at wavelengths near 11 nm
27天前
已关闭
Can we improve the energy efficiency of EUV lithography?
1个月前
已完结
Dual-band reflection from single-stack multilayer systems: a case study for the extreme ultraviolet and beyond
1个月前
已完结
皖公网安备34019202002308
