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32 积分 2024-09-08 加入
Understanding the onset of EUV resist chemical stochastics
2个月前
已完结
An In situ Analysis of the Dissolution Characteristics of Half Pitch Line and Space Extreme Ultraviolet Lithography Resist Patterns
2个月前
已关闭
Development of main chain scission type photoresists for EUV lithography
2个月前
已完结
Highly fluorinated alternating copolymer possessing high glass transition temperature and cross-linking capabilities under extreme UV radiation
3个月前
已完结
Investigating metal oxide resists for patterning 28-nm pitch structures using single exposure extreme ultraviolet: defectivity, electrical test, and voltage contrast study
3个月前
已完结
Investigating metal oxide resists for patterning 28-nm pitch structures using single exposure extreme ultraviolet: defectivity, electrical test, and voltage contrast study
3个月前
已关闭
A NIST facility for resonant soft x-ray scattering measuring nano-scale soft matter structure at NSLS-II
3个月前
已完结
Investigating metal oxide resists for patterning 28-nm pitch structures using single exposure extreme ultraviolet: defectivity, electrical test, and voltage contrast study
3个月前
已关闭
A novel non-chemically amplified resist based on polystyrene-iodonium derivatives for electron beam lithography
3个月前
已完结
Ultrasensitive metal-organic cluster resist for patterning of single exposure high numerical aperture extreme ultraviolet lithography applications
3个月前
已完结