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30 积分 2023-10-27 加入
Enabling process technologies for advanced logic devices beyond FinFET era
2个月前
已完结
Advanced process technologies for continuous logic scaling towards 2nm node and beyond (Invited)
2个月前
已完结
Ultra-thin oxynitride gate dielectrics by pulsed-RF DPN for 65 nm general purpose CMOS applications
3个月前
已完结
Exploring the Effect of Gate Oxide Process on Electrical Performance of CMOS Device
3个月前
已完结
Steam oxidation in Applied Materials' RTP systems
3个月前
已完结
Steam oxidation in Applied Materials' RTP systems
3个月前
已完结
Impacts of RTP Pyrometer Offsets on Wafer Overlay Residue
3个月前
已完结
Correlation between the reliability of ultrathin ISSG SiO 2 and hydrogen content
3个月前
已完结
Influence of I/O oxide process on the NBTI performance of 28nm HfO2-based HKMG p-MOSFETs
3个月前
已完结
Side and Corner Region Non-Uniformities in Grown SiO2 and Their Implications on Current, Capacitance and Breakdown Characteristics
3个月前
已完结
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