材料科学
氮化镓
镓
光电子学
肖特基二极管
击穿电压
二极管
肖特基势垒
氧化物
外延
氮化物
金属半导体结
图层(电子)
电压
纳米技术
电气工程
冶金
工程类
作者
Tao Fang,Lingqi Li,Guangrui Xia,Hongyu Yu
出处
期刊:Chinese Physics B
[IOP Publishing]
日期:2020-10-14
卷期号:30 (2): 027301-027301
被引量:1
标识
DOI:10.1088/1674-1056/abc0dd
摘要
With technology computer-aided design (TCAD) simulation software, we design a new structure of gallium oxide on gallium–nitride Schottky barrier diode (SBD). The parameters of gallium oxide are defined as new material parameters in the material library, and the SBD turn-on and breakdown behavior are simulated. The simulation results reveal that this new structure has a larger turn-on current than Ga 2 O 3 SBD and a larger breakdown voltage than GaN SBD. Also, to solve the lattice mismatch problem in the real epitaxy, we add a ZnO layer as a transition layer. The simulations show that the device still has good properties after adding this layer.
科研通智能强力驱动
Strongly Powered by AbleSci AI