薄脆饼
蚀刻(微加工)
材料科学
干法蚀刻
半导体
各向同性腐蚀
反应离子刻蚀
光电子学
纳米技术
图层(电子)
作者
Zhu Jin,Yingying Liu,Ning Xia,Xiangwei Guo,Zijian Hong,Hui Zhang,Deren Yang
出处
期刊:CrystEngComm
[The Royal Society of Chemistry]
日期:2021-12-29
卷期号:24 (6): 1127-1144
被引量:10
摘要
Wet etching is a simple and effective method to identify defects, fabricate patterns, and polish wafers of semiconductors. We highlight recent progress in wet etching of β-Ga 2 O 3 substrates with an aim to comprehensively understand the etching behavior and mechanism.
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