电阻率和电导率
材料科学
溅射
基质(水族馆)
Crystal(编程语言)
衍射
矿物学
表面粗糙度
薄膜
图层(电子)
复合材料
光学
纳米技术
化学
海洋学
电气工程
物理
地质学
工程类
程序设计语言
计算机科学
作者
Koji Mizukoshi,Tomoya Yamamura,Yasuhiro Tomioka,Midori Kawamura
标识
DOI:10.35848/1347-4065/abdabd
摘要
Abstract In order to improve the heat insulating properties of low-emissivity coatings, it is necessary to reduce the electrical resistivity of their multilayer structure, which consists of an Ag layer and oxide layers. In this study, structures comprising glass/ZnO/Ag and glass/TiO 2 /ZnO/Ag were deposited by sputtering, and the effects of these layers on the electrical resistivity were investigated. For a ZnO layer deposited at low sputtering gas pressure, lower surface roughness reduced the electrical resistivity of the Ag layer. Also, it was found that the electrical resistivity could be further decreased by inserting a TiO 2 lowermost layer between the substrate and the ZnO layer. The results of X-ray diffraction and X-ray reflectivity measurements showed that the decrease in resistivity was mainly due to the improved crystal orientation of the ZnO and Ag layers.
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