X射线光电子能谱
光催化
微晶
薄膜
材料科学
锌
热分解
硅
氧化物
沉积(地质)
化学工程
蒸发
分析化学(期刊)
纳米技术
化学
冶金
催化作用
有机化学
古生物学
物理
沉积物
工程类
热力学
生物
作者
Osama A. Fouad,Adel A. Ismail,Z.I. Zaki,Reda M. Mohamed
标识
DOI:10.1016/j.apcatb.2005.07.006
摘要
Thin zinc oxide (ZnO) films have been grown on silicon substrates by thermal physical vapor deposition approach. X-ray diffraction (XRD) analyses reveal that the deposited films are polycrystalline ZnO phase. Atomic force microscopy images (AFM) show needle-like shape highly oriented ZnO crystals. Thin film thickness ranges from 10 to 80 nm. X-ray photoelectron spectroscopy (XPS) results declare that the films compose mainly of Zn and O. Nevertheless, Si is not detected in the films and consequently no possibility of any silicide formation as is confirmed by XRD analysis. Photocatalytic decomposition of azo-reactive dye on ZnO films is tested. The results show that the dye decomposition efficiency increases with decreasing pH. Maximum photodecomposition, 99.6% is obtained at pH 2 with 10 mg/l dye concentration.
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