材料科学
离子
凝聚态物理
核磁共振
纳米技术
物理
量子力学
作者
Yasuo Gondo,Keizô Aoyagi,Tsutomu Ishi,H. Kogure,Y. Suezawa
标识
DOI:10.1016/0304-8853(91)90301-p
摘要
Abstract Investigations on the structural and magnetic properties of the self-ion-implanted Fe and Ni films were reported. In the present study, as the result of the self-ion-implantation, only the influence of the lattice disorder was examined. An enhancement of specific Faraday rotation of the Fe ion implanted Fe layer was found at low doses. It was also found at such low doses that the dose dependence of FMR, electrical resistance and the structure of the Ni ion implanted Ni films showed clearly the release of internal stress in the films.
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