XPS analysis of adsorption of oxygen molecules on the surface of Ti and TiNx films in vacuum

XPS has been used for the study of oxygen adsorption on the surface of titanium and TiN0.75 films in vacuum (10−5 Pa) at room temperature. It is established that during the oxygen adsorption process the surface of the films is oxidized to form TiO2 with the oxidized layer thickness being higher in the case of titanium films than in the case of titanium nitride films. The amounts of Ti2O3 and Ti3O5 oxides in the oxidized layer (after O2 binding on titanium) proved to be insignificant, and no titanium monoxide could be registered. Oxygen is partially dissolved in the titanium structure to form a solid solution. A stable protective TiO2 layer is formed on the titanium film surface at an oxygen adsorption exposure of 1200 Langmuir (L) and at an exposure of 100 L on the TiN0.75 film surface.